Publication Information

Title: Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices

Type: Journal

Info: Electrochemical and Solid-State Letters, 12 (4) H92-H94 (2009)

Date: 2008-12-08

DOI: http://dx.doi.org/10.1149/1.3067834

Author Information

Name

Institution

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Films

Plasma HfO2 using Custom

Deposition Temperature = 300C

352535-01-4

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Images

SEM, Scanning Electron Microscopy

JEOL JSM-6701F

Images

TEM, Transmission Electron Microscope

JEOL 3010

Flat Band Voltage Shift

C-V, Capacitance-Voltage Measurements

Agilent B1500A Semiconductor Device Analyzer

Charge Retention Time

C-t, Capacitance-time Measurements

Agilent B1500A Semiconductor Device Analyzer

Substrates

Si(100)

Pt

Keywords

Notes

755

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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