Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films

Type:
Conference Proceedings
Info:
ECS Trans. 2014 volume 64, issue 9, 279-289
Date:
2014-10-08

Author Information

Name Institution
Sharka M. ProkesU.S. Naval Research Laboratory

Films


Film/Plasma Properties

Characteristic: Resistivity, Sheet Resistance
Analysis: -

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Thickness
Analysis: AFM, Atomic Force Microscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Substrates

Notes

Beneq TFS-200 PEALD Ag for plasmonic study.
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