Publication Information

Title: Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control

Type: Conference Proceedings

Info: Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 977807

Date: 2016-02-21

DOI: http://dx.doi.org/10.1117/12.2220287

Author Information

Name

Institution

IMEC

IMEC

Nova Measuring Instruments GmbH

IMEC

IMEC

IMEC

Nova Measuring Instruments LTD

Nova Measuring Instruments LTD

Nova Measuring Instruments LTD

Nova Measuring Instruments LTD

Films

Plasma SiO2 using ASM Eagle XP8

Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Silicon

Keywords

Notes

814

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

Follow plasma-ald.com

Follow @PlasmaALDGuy Tweet

Shortcuts



© 2014-2017 plasma-ald.com