Publication Information

Title: Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition

Type: Journal

Info: Langmuir, 2015, 31 (18), pp 5057-5062

Date: 2015-04-03

DOI: http://dx.doi.org/10.1021/acs.langmuir.5b00216

Author Information

Name

Institution

Stanford University

National Institute of Chemistry Slovenia

Stanford University

Stanford University

Films

Deposition Temperature Range = 200-250C

3275-24-9

7732-18-5

Deposition Temperature Range = 200-250C

3275-24-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Images

TEM, Transmission Electron Microscope

FEI Tecnai G2 F20 S-Twin

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Electron Diffraction

FEI Tecnai G2 F20 S-Twin

Chemical Composition, Impurities

EDS, EDX, Energy Dispersive X-ray Spectroscopy

FEI Tecnai G2 F20 S-Twin

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

Synchrotron

Substrates

Keywords

Notes

347

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

Follow plasma-ald.com

Follow @PlasmaALDGuy Tweet

Shortcuts



© 2014-2017 plasma-ald.com