Publication Information

Title: Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach

Type: Conference Proceedings

Info: Proc. SPIE 9428, Advanced Etch Technology for Nanopatterning IV

Date: 2015-02-22

DOI: http://dx.doi.org/10.1117/12.2085812

Author Information

Name

Institution

CEA - Grenoble

CEA - Grenoble

CEA - Grenoble

CEA - Grenoble

CEA - Grenoble

CEA - Grenoble

CEA - Grenoble

CEA - Grenoble

CEA - Grenoble

Films

Plasma SiO2 using ASM EmerALD

Deposition Temperature = 50C

27804-64-4

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Substrates

Keywords

Notes

532

Disclaimer

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