Title: Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
Info: J. Vac. Sci. Technol. A 30(2), Mar/Apr 2012
Cary Eclipse Fluoresence Spectrophotometer
Cary Varian 100 UV-Vis Spectrometer
FTIR, Fourier Transform InfraRed spectroscopy
Bruker Vertex 70
Crystallinity, Crystal Structure, Grain Size, Atomic Structure
GIXRD, Grazing Incidence X-Ray Diffraction
TMA decomposition above 300 (ref 11).
Si RCA cleaned + HF dip.
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