Hafnia and alumina on sulphur passivated germanium

Type:
Journal
Info:
Vacuum, Volume 122, Part B, 2015, Pages 306 - 309
Date:
2015-03-18

Author Information

Name Institution
M. AlthobaitiUniversity of Liverpool
S. MatherUniversity of Liverpool
Naser SedghiUniversity of Liverpool
Vinod R. DhanakUniversity of Liverpool
Ivona Z. MitrovicUniversity of Liverpool
Steve HallUniversity of Liverpool
Paul R. ChalkerUniversity of Liverpool

Films

Plasma HfO2


Thermal HfO2


Plasma Al2O3


Thermal Al2O3


Film/Plasma Properties

Characteristic: Interfacial Layer
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Ge

Notes

478