Publication Information

Title: Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films

Type: Journal

Info: Journal of The Electrochemical Society, 158 (4) G92-G96 (2011)

Date: 2010-12-14

DOI: http://dx.doi.org/10.1149/1.3552616

Author Information

Name

Institution

Materials innovation institute M2i

Materials innovation institute M2i

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Plasma CoOx using Custom ICP

Deposition Temperature Range = 100-400C

1277-43-6

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Gas Phase Species

QMS, Quadrupole Mass Spectrometer

Pfeiffer QMS 200

Thickness

Ellipsometry

J.A. Woollam M-2000U

Thickness

Ellipsometry

J.A. Woollam M-2000D

Refractive Index

Ellipsometry

J.A. Woollam M-2000U

Refractive Index

Ellipsometry

J.A. Woollam M-2000D

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Philips X'Pert MPD Diffactometer

Thickness

XRR, X-Ray Reflectivity

Bruker D8 Advance

Chemical Composition, Impurities

FTIR, Fourier Transform InfraRed spectroscopy

Bruker Optics Tensor 27

Resistivity, Sheet Resistance

Four-point Probe

Signatone

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

NT-MDT Solver P47SPM

Substrates

Si(100)

SiO2

Keywords

Notes

694

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