Publication Information

Title: In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides

Type: Journal

Info: J. Mater. Chem. C, 2015, 3, 4852-4858

Date: 2015-03-31

DOI: http://dx.doi.org/10.1039/C4TC02686A

Author Information

Name

Institution

Yonsei University

Ulsan National Institute of Science and Technology

Ulsan National Institute of Science and Technology

Yonsei University

Yonsei University

Applied Materials

Incheon National University

Stanford University

University of Wisconsin - Madison

Yonsei University

Films

Deposition Temperature = 250C

19962-11-9

7782-44-7

Deposition Temperature = 250C

75-24-1

7782-44-7

Plasma MgO using SNTEK Co. ALD 5008

Deposition Temperature = 250C

1284-72-6

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Refractive Index

Ellipsometry

Unknown

Capacitance

C-V, Capacitance-Voltage Measurements

Keithley 590 CV Analyzer

Flat Band Voltage

C-V, Capacitance-Voltage Measurements

Keithley 590 CV Analyzer

Hysteresis

C-V, Capacitance-Voltage Measurements

Keithley 590 CV Analyzer

Interface Trap Density

C-V, Capacitance-Voltage Measurements

Keithley 590 CV Analyzer

Dielectric Constant, Permittivity

C-V, Capacitance-Voltage Measurements

Keithley 590 CV Analyzer

Leakage Current

I-V, Current-Voltage Measurements

Agilent 4155C Semiconductor Parameter Analyzer

Bonding States

XPS, X-ray Photoelectron Spectroscopy

Unknown

Interfacial Layer

TEM, Transmission Electron Microscope

JEOL 2100

Images

TEM, Transmission Electron Microscope

JEOL 2100

Chemical Composition, Impurities

EDS, EDX, Energy Dispersive X-ray Spectroscopy

JEOL 2100

Substrates

Ge

Keywords

High-k Dielectric Thin Films

Notes

PEALD HfO2 on TMA and MgCp2 cleaned Ge substrate was studied.

PEALD HfO2, HfO2/Al2O3, and HfO2/MgO on uncleaned Ge substrate were also studied for comparison.

339

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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