Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide

Type:
Journal
Info:
J. Phys. Chem. C, 2009, 113 (30), pp 12962-12965
Date:
2009-06-08

Author Information

Name Institution
Vikrant R. RaiColorado School of Mines
Sumit AgarwalColorado School of Mines

Films

Plasma TiO2


Film/Plasma Properties

Characteristic: Surface Reactions
Analysis: ATR-FTIR

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Substrates

ZnSe
Silicon

Notes

758