Publication Information

Title: Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy

Type: Journal

Info: Journal of Alloys and Compounds, Volume 698, 2017, Pages 141 - 146

Date: 2016-12-18

DOI: https://doi.org/10.1016/j.jallcom.2016.12.238

Author Information

Name

Institution

Shenzhen University

Shenzhen University

Shanghai Institute of Microsystem and Information Technology

Shenzhen University

Shenzhen University

Shanghai Institute of Microsystem and Information Technology

Shenzhen University

National University Singapore

Films

Plasma TiO2 using Beneq TFS-200

Deposition Temperature = 200C

7550-45-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Silicon

Keywords

Notes

920

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

Follow plasma-ald.com

Follow @PlasmaALDGuy Tweet

Shortcuts



© 2014-2017 plasma-ald.com