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Publication Information

Title: Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching

Type: Journal

Info: Nanotechnology 27 (2016) 255603

Date: 2016-04-26

DOI: https://doi.org/10.1088/0957-4484/27/25/255603

Author Information

Name

Institution

Friedrich-Schiller-Universität Jena

Friedrich-Schiller-Universität Jena

Friedrich-Schiller-Universität Jena

Friedrich-Schiller-Universität Jena

Films

Deposition Temperature = 150C

75-24-1

7782-44-7

Deposition Temperature = 150C

15112-89-7

7782-44-7

Deposition Temperature = 150C

75-24-1

15112-89-7

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Porosity

Unknown

Unknown

Refractive Index

Unknown

Unknown

Substrates

Keywords

AR, AntiReflective Coating

Notes

827

Disclaimer

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