High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 30, 021502 (2012)
Date:
2011-12-30

Author Information

Name Institution
Eric DickeyLotus Applied Technology
William A. BarrowLotus Applied Technology

Films

Plasma TiO2

Hardware used: Custom


CAS#: 7782-44-7

Plasma Al2O3


Film/Plasma Properties

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: -

Substrates

PET, Polyethylene Terephthalate

Notes

649