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Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34(1) 2016
Date:
2015-10-26
Author Information
| Name | Institution |
|---|---|
| Alexander Strobel | Westsächsische Hochschule Zwickau |
| Hans-Dieter Schnabel | Westsächsische Hochschule Zwickau |
| Ullrich Reinhold | Westsächsische Hochschule Zwickau |
| Sebastian Rauer | Westsächsische Hochschule Zwickau |
| Andreas Neidhardt | Westsächsische Hochschule Zwickau |
Films
Plasma TiO2
Plasma TiO2
Plasma WO3
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Substrates
| Si(111) |
Notes
| 406 |