Publication Information

Title: Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films

Type: Journal

Info: Journal of Vacuum Science & Technology A 34(1) 2016

Date: 2015-10-26

DOI: http://dx.doi.org/10.1116/1.4935356

Author Information

Name

Institution

Westsächsische Hochschule Zwickau

Westsächsische Hochschule Zwickau

Westsächsische Hochschule Zwickau

Westsächsische Hochschule Zwickau

Westsächsische Hochschule Zwickau

Films

Plasma TiO2 using FHR ALD 150

Deposition Temperature Range = 30-180C

7550-45-0

7782-44-7

Plasma TiO2 using FHR ALD 150

Deposition Temperature Range = 30-180C

7550-45-0

7732-18-5

Plasma WO3 using FHR ALD 150

Deposition Temperature Range = 30-180C

7783-82-6

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

SENTECH SE 800

Refractive Index

Ellipsometry

SENTECH SE 800

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

Unknown

Density

XRR, X-Ray Reflectivity

Unknown

Morphology, Roughness, Topography

XRR, X-Ray Reflectivity

Unknown

Thickness

XRR, X-Ray Reflectivity

Unknown

Substrates

Si(111)

Keywords

Notes

406

Disclaimer

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