Publication Information

Title: Enhanced non-volatile memory characteristics with quattro-layer graphene nanoplatelets vs. 2.85-nm Si nanoparticles with asymmetric Al2O3/HfO2 tunnel oxide

Type: Journal

Info: Nanoscale Research Letters 2015 10:248

Date: 2015-05-28

DOI: http://dx.doi.org/10.1186/s11671-015-0957-5

Author Information

Name

Institution

Masdar Institute of Science and Technology Abu Dhabi

UNAM - National Nanotechnology Research Center

Bilkent University

UNAM - National Nanotechnology Research Center

University of Illinois - Urbana/Champaign

Films

Deposition Temperature = 195C

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Images

SEM, Scanning Electron Microscopy

Unknown

Capacitance

C-V, Capacitance-Voltage Measurements

Agilent B1505A Semiconductor Device Analyzer

Threshold Voltage Shift

C-V, Capacitance-Voltage Measurements

Agilent B1505A Semiconductor Device Analyzer

Substrates

Si(111)

Keywords

Notes

360

Disclaimer

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