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New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
Type:
Journal
Info:
J. Vac. Sci. Technol. A 31(1), Jan/Feb 2013
Date:
2012-11-27
Author Information
| Name | Institution |
|---|---|
| Matthew A. Thomas | University of Arkansas at Little Rock |
| Johnathan C. Armstrong | University of Arkansas at Little Rock |
| J.B. Cui | University of Arkansas at Little Rock |
Films
Other ZnO
Thermal ZnO
Film/Plasma Properties
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Optical Properties
Analysis: PL, PhotoLuminescence
Characteristic: Electrical Properties
Analysis: Hall Measurements
Substrates
| Glass |
| Si(100) |
| SiO2 |
Notes
| PET-ALD: plasma enhanced thermal ALD with H2O thermal followed by H2 plasma. |
| Aluminum doping of ZnO better with DMAI than TMA. |
| 141 |