Publication Information

Title: Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources

Type: Journal

Info: Journal of Vacuum Science & Technology A 34, 01B103 (2016)

Date: 2015-11-16

DOI: http://dx.doi.org/10.1116/1.4936622

Author Information

Name

Institution

IBM

IBM

IBM

IBM

IBM

IBM

IBM

IBM

U.S. Naval Research Laboratory

U.S. Naval Research Laboratory

U.S. Naval Research Laboratory

U.S. Naval Research Laboratory

IBM

Films

Other HfO2 using Unknown

Deposition Temperature Range N/A

7727-37-9

Other HfO2 using Unknown

Deposition Temperature Range N/A

7782-44-7

Other HfO2 using Unknown

Deposition Temperature Range N/A

2551-62-4

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Unknown

Transistor Characteristics

Transistor Characterization

Unknown

Substrates

Graphene

Keywords

Notes

Graphene was subjected to N2, O2, or SF6 plasma for functionalization prior to thermal HfO2 ALD growth.

432

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