Plasma enhanced atomic layer deposition of zinc sulfide thin films

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 35, 01B111 (2017)
Date:
2016-10-27

Author Information

Name Institution
Jakob KuhsGhent University
Thomas DobbelaereGhent University
Zeger HensGhent University
Christophe DetavernierGhent University

Films

Plasma ZnS


Thermal ZnS


Film/Plasma Properties

Characteristic: Transmittance
Analysis: Optical Transmission

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer

Substrates

SiO2
Quartz

Notes

895