Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
Type:
Journal
Info:
Journal of the Korean Physical Society, Vol. 46, No. 4, April 2005, pp. L756-L759
Date:
2005-02-01
DOI:
No DOI
Author Information
Name | Institution |
---|---|
Woonyoung Lee | Chonnam National University |
Yongkook Choi | Chonnam National University |
Kwangjun Hong | Chosun University |
Nam-Hoon Kim | Chosun University |
Yongju Park | Chosun University |
Jin-Seong Park | Chosun University |
Films
Film/Plasma Properties
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Thickness
Analysis: Ellipsometry
Substrates
Si(100) |
Notes
Films annealed. |
122 |