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Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34, 01A140 (2016)
Date:
2015-12-03
Author Information
| Name | Institution |
|---|---|
| Stephen Weeks | Intermolecular |
| Greg Nowling | Intermolecular |
| Nobi Fuchigami | Intermolecular |
| Michael Bowes | Intermolecular |
| Karl Littau | Intermolecular |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Wet Etch Resistance
Analysis: Wet Etch
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: HFS, Hydrogen Forward Scattering
Characteristic: Density
Analysis: RBS, Rutherford Backscattering Spectrometry
Substrates
| Si(100) |
Notes
| 446 |