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In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 30, 01A158 (2012)
Date:
2011-11-18
Author Information
| Name | Institution |
|---|---|
| Vikrant R. Rai | Colorado School of Mines |
| Sumit Agarwal | Colorado School of Mines |
Films
Film/Plasma Properties
Characteristic: Gas Phase Species
Analysis: OES, Optical Emission Spectroscopy
Characteristic: Surface Reactions
Analysis: ATR-FTIR
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Substrates
Notes
| 651 |