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Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
Type:
Journal
Info:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms Volume 307, 15 July 2013, Pages 463-467
Date:
2012-12-24
Author Information
| Name | Institution |
|---|---|
| Duo Cao | Chinese Academy of Sciences |
| Xinhong Cheng | Chinese Academy of Sciences |
| Tingting Jia | Chinese Academy of Sciences |
| Li Zheng | Chinese Academy of Sciences |
| Dawei Xu | Chinese Academy of Sciences |
| Zhongjian Wang | Chinese Academy of Sciences |
| Chao Xia | Chinese Academy of Sciences |
| Yuehui Yu | Chinese Academy of Sciences |
Films
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Interfacial Layer
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Characteristic: EOT, Equivalent Oxide Thickness
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Interface State Density
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
Notes
| 676 |