Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates

Type:
Journal
Info:
Journal of The Electrochemical Society, 156 (4) H255-H262 (2009)
Date:
2008-11-13

Author Information

Name Institution
Sonja SionckeIMEC

Films

Thermal Al2O3



Film/Plasma Properties

Substrates

Notes

198