Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 30, 01A104 (2012)
Date:
2011-08-23

Author Information

Name Institution
Jaesang LeeHanyang University
Hyungchul KimHanyang University
Taeyong ParkHanyang University
Youngbin KoHanyang University
Jaehun RyuHanyang University
Heeyoung JeonHanyang University
Jingyu ParkHanyang University
Hyeongtag JeonHanyang University

Films


Film/Plasma Properties

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements

Substrates

Si(100)
Al2O3
Au

Notes

634