Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition

Type:
Journal
Info:
Journal of Materials Science & Technology Volume 33, Issue 3, Pages 295-299
Date:
2016-05-24

Author Information

Name Institution
Eun-Young YunPusan National University
Woo-Jae LeePusan National University
Qi Min WangGuangdong University of Technology
Se-Hun KwonPusan National University

Films


Film/Plasma Properties

Characteristic: Resistivity, Sheet Resistance
Analysis: -

Characteristic: Corrosion
Analysis: Potentiodynamic Polarization Test

Substrates

Stainless Steel 316L

Notes

929