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Effect of Plasma Power of Plasma Enhanced Atomic Layer Deposition Process for Gate Insulator Deposition in Top-Gate Thin-Film Transistors
Type:
Conference Proceedings
Info:
2015 SID Symposium Digest of Technical Papers
Date:
2015-09-22
Author Information
| Name | Institution |
|---|---|
| Jong Bum Ko | Korea Advanced Institute of Science and Technology |
| Hye In Yeom | Korea Advanced Institute of Science and Technology |
| Chi Sun Hwang | Electronics and Telecommunication Research Institute, (ETRI) |
| Sung Haeng Cho | Electronics and Telecommunication Research Institute, (ETRI) |
| Sang-Hee Ko Park | Korea Advanced Institute of Science and Technology |
Films
Film/Plasma Properties
Substrates
Notes
| 461 |