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Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
Type:
Journal
Info:
physica status solidi (a) Volume 209, Issue 2, pages 266--271, 2012
Date:
2011-11-03
Author Information
| Name | Institution |
|---|---|
| Mustafa Alevli | Bilkent University |
| Çağla Özgit | Bilkent University |
| İnci Dönmez | Bilkent University |
| Necmi Biyikli | Bilkent University |
Films
Plasma AlN
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Substrates
| Si(100) |
Notes
| 697 |