Conformality, Step Coverage Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Conformality, Step Coverage returned 74 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
2Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
3ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
4ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
5An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
6Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
7Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
8Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
9Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
10Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
11Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
12Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
13Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
14Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
15Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
16Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
17Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
18Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
19Copper-ALD Seed Layer as an Enabler for Device Scaling
20Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
21Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
22Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
23Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
24Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
25Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
26Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
27Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
28Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
29Hydrogen plasma-enhanced atomic layer deposition of copper thin films
30Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
31Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
32Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
33Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization
34Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
35Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
36Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
37Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
38Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
39Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
40NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
41Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
42Plasma enhanced atomic layer deposition of Ga2O3 thin films
43Plasma enhanced atomic layer deposition of SiNx:H and SiO2
44Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
45Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
46Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
47Plasma enhanced atomic layer deposition of zinc sulfide thin films
48Plasma Enhanced Atomic Layer Deposition on Powders
49Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
50Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
51Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
52Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
53Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
54Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
55Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
56Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
57Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
58Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
59Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
60Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
61Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
62Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
63Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
64Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
65Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
66Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
67Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
68Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
69Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
70Study on the characteristics of aluminum thin films prepared by atomic layer deposition
71The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
72Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
73Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
74Very high frequency plasma reactant for atomic layer deposition


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