Crystallinity, Crystal Structure, Grain Size, Atomic Structure Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
2A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
4A route to low temperature growth of single crystal GaN on sapphire
5Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
6ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
7AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
8Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
9An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
10Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
11Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
12Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
13Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
14Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
15Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
16Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
17Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
18Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
19Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
20Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
21Atomic layer deposition of GaN at low temperatures
22Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
23Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
24Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
25Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
26Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
27Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
28Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
29Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
30Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
31Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
32Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
33Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
34Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
35Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
36Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
37Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
38Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
39Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
40Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
41Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
42Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
43Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
44Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
45Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
46Comparative study of ALD SiO2 thin films for optical applications
47Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
48Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
49Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
50Comparison of trimethylgallium and triethylgallium as 'Ga' source materials for the growth of ultrathin GaN films on Si(100) substrates via hollow-cathode plasma-assisted atomic layer deposition
51Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
52Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
53Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
54Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
55Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
56Crystalline growth of AlN thin films by atomic layer deposition
57Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
58Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
59Densification of Thin Aluminum Oxide Films by Thermal Treatments
60Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
61Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
62Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
63Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
64Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
65Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
66Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
67Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
68Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
69Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
70Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
71Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition
72Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
73Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
74Electrical characteristics of β-Ga2O3 thin films grown by PEALD
75Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
76Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
77Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
78Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
79Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
80Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
81Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
82Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
83Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
84Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
85Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
86Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
87Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
88Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
89Evaluation of plasma parameters on PEALD deposited TaCN
90Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
91Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
92Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition
93Fabrication of flexible polymer-GaN core-shell nanofibers by the combination of electrospinning and hollow cathode plasma-assisted atomic layer deposition
94Fast PEALD ZnO Thin-Film Transistor Circuits
95Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
96Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
97Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
98Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
99Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
100Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
101Fully CMOS-compatible titanium nitride nanoantennas
102Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
103Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
104Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
105Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
106Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
107Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
108Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
109Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
110Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
111Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
112HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
113High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
114High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
115High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
116High-Reflective Coatings For Ground and Space Based Applications
117Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
118Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
119Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
120Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
121Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
122Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
123Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
124Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
125Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
126In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
127In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
128In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
129In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
130Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
131Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
132Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
133Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
134Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
135Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
136Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
137Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
138Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
139Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
140Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
141Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
142Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
143Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
144Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
145Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
146Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
147Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
148Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
149Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
150Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels
151Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
152Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
153Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
154Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
155Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
156Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
157Low-Temperature Deposition of Hexagonal Boron Nitride Via Sequential Injection of Triethylboron and N2/H2 Plasma
158Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
159Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
160Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
161Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
162Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
163Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
164Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
165Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)
166Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
167Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
168Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
169Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
170Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
171New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
172NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
173Nitride memristors
174Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
175Optical characteristics of nanocrystalline AlxGa1-xN thin films deposited by hollow cathode plasma-assisted atomic layer deposition
176Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
177Oxygen migration in TiO2-based higher-k gate stacks
178Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
179PEALD AlN: controlling growth and film crystallinity
180PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
181Perspectives on future directions in III-N semiconductor research
182Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
183Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
184Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
185Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
186Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
187Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
188Plasma enhanced atomic layer deposition of Fe2O3 thin films
189Plasma enhanced atomic layer deposition of Ga2O3 thin films
190Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
191Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
192Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
193Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
194Plasma enhanced atomic layer deposition of zinc sulfide thin films
195Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
196Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
197Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
198Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
199Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
200Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
201Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
202Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
203Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
204Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
205Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
206Plasma-enhanced atomic layer deposition of BaTiO3
207Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
208Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
209Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
210Plasma-Enhanced Atomic Layer Deposition of Ni
211Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
212Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
213Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
214Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
215Plasma-enhanced atomic layer deposition of superconducting niobium nitride
216Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
217Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
218Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
219Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
220Plasma-Modified Atomic Layer Deposition
221Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
222Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
223Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
224Properties of AlN grown by plasma enhanced atomic layer deposition
225Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
226Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
227Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
228Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
229Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
230Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
231Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
232Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
233Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
234Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
235Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
236Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
237Remote Plasma ALD of Platinum and Platinum Oxide Films
238Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
239Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
240Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
241Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
242Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
243Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
244Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
245Room-Temperature Atomic Layer Deposition of Platinum
246Ru thin film grown on TaN by plasma enhanced atomic layer deposition
247Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
248Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
249Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
250Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
251Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
252Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
253SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
254Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
255Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
256Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
257Structural and optical characterization of low-temperature ALD crystalline AlN
258Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
259Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
260Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
261Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
262Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
263Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
264Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
265Study on the characteristics of aluminum thin films prepared by atomic layer deposition
266Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
267Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
268Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
269Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
270Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
271Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
272Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
273Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
274Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
275Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
276Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
277TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
278Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
279Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
280Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
281The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
282The effects of layering in ferroelectric Si-doped HfO2 thin films
283The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
284The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
285The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
286The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
287The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
288The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
289Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
290Thin film GaP for solar cell application
291Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
292TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
293TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
294Trilayer Tunnel Selectors for Memristor Memory Cells
295Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
296Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
297Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
298Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
299Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
300Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
301Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
302Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
303X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
304ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium

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