Resistivity, Sheet Resistance Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Resistivity, Sheet Resistance returned 264 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
2Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
3Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
4Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
5ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
6Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
7Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
8Film Uniformity in Atomic Layer Deposition
9Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
10Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
11Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
12Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
13Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
14Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
15The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
16Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
17The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
18Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
19In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
20Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
21Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
22Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
23Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
24Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
25Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
26Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
27Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
28Plasma-enhanced atomic layer deposition of titanium vanadium nitride
29Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
30Room-Temperature Atomic Layer Deposition of Platinum
31Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
32Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
33Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
34All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
35Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
36Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
37Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
38Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
39Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
40Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
41Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
42Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
43Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
44Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
45In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
46Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
47Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
48Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
49Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
50Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
51Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
52Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
53Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
54Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
55Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
56Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
57Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
58Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
59Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
60Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
61Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
62Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
63In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
64PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
65Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
66Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
67Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
68Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
69Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
70Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
71Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
72Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
73Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
74Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
75Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
76The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
77Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
78Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
79Plasma-enhanced atomic layer deposition of tungsten nitride
80TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
81Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
82Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
83Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
84Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
85Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
86Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
87Remote Plasma ALD of Platinum and Platinum Oxide Films
88Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
89Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
90Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
91Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
92Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
93Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
94Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
95Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
96Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
97Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
98Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
99Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
100Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
101Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
102Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
103Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
104Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
105Plasma-enhanced atomic layer deposition of vanadium nitride
106Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
107Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
108Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
109Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
110Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
111Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
112Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
113Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
114Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
115Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
116Plasma-enhanced atomic layer deposition of Co on metal surfaces
117Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
118Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
119Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
120Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
121Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
122Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
123A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
124The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
125Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
126Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
127Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
128Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
129Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
130Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
131Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
132Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
133Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
134Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
135Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
136A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
137Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
138Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
139Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
140Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
141Evaluation of plasma parameters on PEALD deposited TaCN
142High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
143Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
144Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
145Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
146WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
147Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
148Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
149Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
150In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
151Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
152High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
153In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
154Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
155Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
156Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
157Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
158Hydrogen plasma-enhanced atomic layer deposition of copper thin films
159Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
160Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
161Atmospheric pressure plasma enhanced spatial ALD of silver
162Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
163Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
164Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
165Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
166Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
167Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
168High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
169The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
170A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
171The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
172Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
173Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
174Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
175Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
176Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
177Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
178A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
179Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
180Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
181Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
182Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
183Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
184Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
185Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
186Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
187Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
188Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
189Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
190Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
191Atomic layer deposition of titanium nitride for quantum circuits
192Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
193Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
194Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
195Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
196Plasma-Modified Atomic Layer Deposition
197Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
198Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
199Study on the characteristics of aluminum thin films prepared by atomic layer deposition
200Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
201Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
202High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
203Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
204Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
205Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
206Atomic layer deposition of titanium nitride from TDMAT precursor
207Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
208Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
209TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
210Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
211Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
212Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
213Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
214Copper-ALD Seed Layer as an Enabler for Device Scaling
215Microwave properties of superconducting atomic-layer deposited TiN films
216Plasma-Enhanced Atomic Layer Deposition of Ni
217Atomic Layer Deposition of the Conductive Delafossite PtCoO2
218Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
219Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
220A route to low temperature growth of single crystal GaN on sapphire
221PEALD of Copper using New Precursors for Next Generation of Interconnections
222Plasma-enhanced atomic layer deposition of superconducting niobium nitride
223Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
224Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
225Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
226Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
227Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
228Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
229Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
230Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
231Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
232Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
233Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
234Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
235Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
236Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
237Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
238Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
239Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
240Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
241Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
242Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
243Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
244Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
245Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
246GeSbTe deposition for the PRAM application
247Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
248Fully CMOS-compatible titanium nitride nanoantennas
249Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
250Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
251Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
252Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
253Ru thin film grown on TaN by plasma enhanced atomic layer deposition
254Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
255Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
256Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
257Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
258Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
259Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
260Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
261Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
262Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
263Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor