Morphology, Roughness, Topography Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Morphology, Roughness, Topography returned 229 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
2A route to low temperature growth of single crystal GaN on sapphire
3Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
4Advances in the fabrication of graphene transistors on flexible substrates
5Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
6AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
7Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
8An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
9An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
10Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
11Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
12Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
13Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
14Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
15Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
16Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
17Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
18Atomic layer deposition of GaN at low temperatures
19Atomic Layer Deposition of Gold Metal
20Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
21Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
22Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
23Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
24Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
25Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
26Atomic Layer Deposition of the Solid Electrolyte LiPON
27Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
28Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
29Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
30Biofilm prevention on cochlear implants
31Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
32Breakdown and Protection of ALD Moisture Barrier Thin Films
33Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
34Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
35Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
36Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
37Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
38Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
39Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
40Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
41Comparative study of ALD SiO2 thin films for optical applications
42Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
43Comparison of trimethylgallium and triethylgallium as 'Ga' source materials for the growth of ultrathin GaN films on Si(100) substrates via hollow-cathode plasma-assisted atomic layer deposition
44Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
45Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
46Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
47Copper-ALD Seed Layer as an Enabler for Device Scaling
48Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
49Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
50Crystalline growth of AlN thin films by atomic layer deposition
51Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
52Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
53Densification of Thin Aluminum Oxide Films by Thermal Treatments
54Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
55Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
56Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
57Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
58Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
59Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
60Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
61Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
62Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition
63Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
64Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
65Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
66Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
67Electrical characteristics of β-Ga2O3 thin films grown by PEALD
68Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
69Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
70Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
71Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
72Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
73Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
74Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
75Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
76Evaluation of plasma parameters on PEALD deposited TaCN
77Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
78Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
79Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition
80Fast PEALD ZnO Thin-Film Transistor Circuits
81Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
82Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
83Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
84Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
85Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
86Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
87Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
88Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
89High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
90High-Reflective Coatings For Ground and Space Based Applications
91Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
92Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
93Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
94Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
95Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
96Hydrogen plasma-enhanced atomic layer deposition of copper thin films
97Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
98Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
99Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
100Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
101Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
102Improved understanding of recombination at the Si/Al2O3 interface
103Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
104Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
105In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
106Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
107Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
108Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
109Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
110Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
111Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
112Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
113Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
114Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
115Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
116Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
117Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
118Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
119Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
120Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
121Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
122Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
123Low-Temperature Deposition of Hexagonal Boron Nitride Via Sequential Injection of Triethylboron and N2/H2 Plasma
124Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
125Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
126Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
127Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
128Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
129Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
130Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)
131Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
132Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
133Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
134Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
135Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
136Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
137Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
138Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
139Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
140Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
141New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
142Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
143Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
144Oxygen migration in TiO2-based higher-k gate stacks
145PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
146Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
147Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
148Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
149Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
150Plasma enhanced atomic layer deposition of Fe2O3 thin films
151Plasma enhanced atomic layer deposition of Ga2O3 thin films
152Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
153Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
154Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
155Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
156Plasma enhanced atomic layer deposition of zinc sulfide thin films
157Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
158Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
159Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
160Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
161Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
162Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
163Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
164Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
165Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
166Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
167Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
168Plasma-enhanced atomic layer deposition of BaTiO3
169Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
170Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
171Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
172Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
173Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
174Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
175Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
176Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
177Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
178Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
179Properties of AlN grown by plasma enhanced atomic layer deposition
180Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
181Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
182Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
183Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
184Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
185Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
186Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
187Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
188Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
189Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
190Remote Plasma ALD of Platinum and Platinum Oxide Films
191Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
192Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
193Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
194Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
195Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
196Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
197Room-Temperature Atomic Layer Deposition of Platinum
198Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
199Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
200Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
201Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
202Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
203Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
204SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
205Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
206Structural and optical characterization of low-temperature ALD crystalline AlN
207Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
208Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
209Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
210Study on the characteristics of aluminum thin films prepared by atomic layer deposition
211Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
212Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
213Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
214Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
215Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
216The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
217The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
218The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
219The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
220The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
221The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
222Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
223Thin film GaP for solar cell application
224Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
225Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
226Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
227Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
228Very high frequency plasma reactant for atomic layer deposition
229ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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