Stress Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Stress returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
2Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
3Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
4Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
5Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
6Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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