3DMAAl, Tris(dimethylamido)aluminum(III), (Me2N)3Al, (Me2N)6Al2, CAS# 32093-39-3

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberCompositionTitle
1Al2O3Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
2AlNTris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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