3DMAAl, (Me2N)3Al, (Me2N)6Al2, Tris (DiMethylAmido) Aluminum(III), CAS# 32093-39-3

Where to buy

NumberVendorRegionLink
1Alfa Aesar🇺🇸Tris(dimethylamino)aluminum dimer
2Santa Cruz Biotechnology🇺🇸Aluminum dimethylamide
3Strem Chemicals, Inc.🇺🇸Hexakis(dimethylamino)dialuminum 98% (99.9%-Al) TDMAA
4Sigma-Aldrich, Co. LLC🇺🇸Tris(dimethylamido)aluminum(III)
5Ereztech🇺🇸Tris(dimethylamino)aluminum

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
2Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
3Experimental and theoretical determination of the role of ions in atomic layer annealing
4Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor