DCS, H2SiCl2, DiChloroSilane, CAS# 4109-96-0

Where to buy

NumberVendorRegionLink
1Gelest🇺🇸Dichlorosilane
2Pegasus Chemicals🇬🇧Dichlorosilane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer epitaxy of Si using atomic H
2Atomic layer controlled deposition of silicon nitride with self-limiting mechanism
3Challenges in spacer process development for leading-edge high-k metal gate technology
4Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
5Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
6Evaluation of Stress Induced by Plasma Assisted ALD SiN Film
7A Silicon Nitride MIM Capacitor for Analog/Mixed-Signal Integrated Circuit using Manufacturable Atomic Layer Deposition Equipment
8Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
9Measurements and modeling of the impact of radical recombination on silicon nitride growth in microwave plasma assisted atomic layer deposition