TBTDET, Tert-Butylimido Tris(DiEthylamino) Tantalum, Ta[N(C2H5)2]3[=NC(CH3)3], CAS# 169896-41-7

Where to buy

NumberVendorLink
1Strem Chemicals, Inc.(t-Butylimido)tris(diethylamino)tantalum(V), min. 98% (99.99%-Ta)
2EpiValenceTantalum tert-butylimido trisdiethylamide
3Sigma-Aldrich, Co. LLCTris(diethylamido)(tert-butylimido)tantalum(V)
4Alfa AesarTantalum tris(diethylamido)-tert-butylimide, 99.99% (metals basis)
5Santa Cruz BiotechnologyTris(diethylamido)(tert-butylimido)tantalum(V)
6Alfa AesarTert-butylimido tris(diethylamido) tantalum

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 18 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberCompositionTitle
1RuTaNAtomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
2RuTaNMicrostructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
3RuTaNNucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
4Ta2O5Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
5TaCxChemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
6TaCNChemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
7TaCNEvaluation of plasma parameters on PEALD deposited TaCN
8TaCNFormation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
9TaCNInterface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
10TaCNPlasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
11TaCNProperties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
12TaCNThe Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
13TaNxChemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
14TaNxIntegration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
15TaNxNucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
16TaNxPreparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
17TaNxThe Properties of Cu Thin Films on Ru Depending on the ALD Temperature
18TaZrO2Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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