Tetrakis[(EthylMethyl)Amido]Zirconium, [(EtMe)N]4Zr, TEMAZr, CAS# 175923-04-3

Where to buy

NumberVendorLink
1Strem Chemicals, Inc.Tetrakis(ethylmethylamino)zirconium, 99% TEMAZ
2Strem Chemicals, Inc.Tetrakis(ethylmethylamino)zirconium(IV) 99% TEMAZ, contained in 50 ml cylinder for CVD/ALD

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 21 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberCompositionTitle
1HfZrO2Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
2HfZrSiOSub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
3ZrO2Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
4ZrO2Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
5ZrO2Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
6ZrO2Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
7ZrO2High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
8ZrO2Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
9ZrO2Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
10ZrO2Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
11ZrO2Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
12ZrO2PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
13ZrO2PEALD ZrO2 Films Deposition on TiN and Si Substrates
14ZrO2Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
15ZrO2Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
16ZrO2RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
17ZrO2The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
18ZrO2Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
19ZrONEnhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
20ZrONImpact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
21ZrONImproved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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