Oxygen, O2, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberCompositionTitle
1Al:BaTiO3Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2Al:WO3Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3Al2O3'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
4Al2O31D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
5Al2O346-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
6Al2O3A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
7Al2O3A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
8Al2O3A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
9Al2O3Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
10Al2O3Advances in the fabrication of graphene transistors on flexible substrates
11Al2O3Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
12Al2O3Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
13Al2O3Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
14Al2O3Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
15Al2O3ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
16Al2O3AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
17Al2O3AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
18Al2O3Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
19Al2O3Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
20Al2O3Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
21Al2O3An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
22Al2O3Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
23Al2O3Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
24Al2O3Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
25Al2O3Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
26Al2O3Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
27Al2O3Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
28Al2O3Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
29Al2O3Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
30Al2O3Band alignment of Al2O3 with (-201) β-Ga2O3
31Al2O3Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
32Al2O3Breakdown and Protection of ALD Moisture Barrier Thin Films
33Al2O3Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
34Al2O3Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
35Al2O3Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
36Al2O3Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
37Al2O3Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
38Al2O3Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
39Al2O3Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
40Al2O3Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
41Al2O3Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
42Al2O3Charge effects of ultrafine FET with nanodot type floating gate
43Al2O3Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
44Al2O3Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
45Al2O3Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
46Al2O3Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
47Al2O3Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
48Al2O3Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
49Al2O3Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
50Al2O3Damage evaluation in graphene underlying atomic layer deposition dielectrics
51Al2O3DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
52Al2O3Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
53Al2O3Demonstration of flexible thin film transistors with GaN channels
54Al2O3Densification of Thin Aluminum Oxide Films by Thermal Treatments
55Al2O3Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
56Al2O3Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
57Al2O3DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
58Al2O3Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
59Al2O3Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
60Al2O3Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
61Al2O3Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
62Al2O3Dynamic tuning of plasmon resonance in the visible using graphene
63Al2O3Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
64Al2O3Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
65Al2O3Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
66Al2O3Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
67Al2O3Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
68Al2O3Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
69Al2O3Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
70Al2O3Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
71Al2O3Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
72Al2O3Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
73Al2O3Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
74Al2O3Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
75Al2O3Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
76Al2O3Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
77Al2O3Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
78Al2O3Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
79Al2O3Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
80Al2O3Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
81Al2O3Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
82Al2O3Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
83Al2O3Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
84Al2O3Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
85Al2O3Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
86Al2O3Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
87Al2O3Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
88Al2O3Energy-enhanced atomic layer deposition for more process and precursor versatility
89Al2O3Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
90Al2O3Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
91Al2O3Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
92Al2O3Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
93Al2O3Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
94Al2O3Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
95Al2O3Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
96Al2O3Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
97Al2O3Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
98Al2O3Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
99Al2O3Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
100Al2O3Experimental verification of electro-refractive phase modulation in graphene
101Al2O3Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
102Al2O3Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
103Al2O3Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
104Al2O3Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
105Al2O3Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
106Al2O3Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
107Al2O3Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
108Al2O3Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
109Al2O3Flexible, light trapping substrates for organic photovoltaics
110Al2O3Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
111Al2O3Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
112Al2O3Hafnia and alumina on sulphur passivated germanium
113Al2O3High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
114Al2O3High-efficiency embedded transmission grating
115Al2O3High-Reflective Coatings For Ground and Space Based Applications
116Al2O3Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
117Al2O3Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
118Al2O3Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
119Al2O3Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
120Al2O3Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
121Al2O3Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
122Al2O3Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
123Al2O3Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
124Al2O3Improved understanding of recombination at the Si/Al2O3 interface
125Al2O3Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
126Al2O3Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
127Al2O3Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
128Al2O3Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
129Al2O3In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
130Al2O3In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
131Al2O3In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
132Al2O3Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
133Al2O3Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
134Al2O3Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
135Al2O3Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
136Al2O3Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
137Al2O3Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
138Al2O3Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
139Al2O3Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
140Al2O3Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
141Al2O3Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
142Al2O3Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
143Al2O3Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
144Al2O3Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
145Al2O3Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
146Al2O3Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
147Al2O3Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
148Al2O3Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
149Al2O3Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
150Al2O3Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
151Al2O3Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
152Al2O3Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
153Al2O3Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
154Al2O3Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
155Al2O3Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
156Al2O3Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
157Al2O3Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
158Al2O3Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
159Al2O3Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
160Al2O3Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
161Al2O3Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
162Al2O3Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
163Al2O3Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
164Al2O3Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
165Al2O3Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
166Al2O3Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
167Al2O3MANOS performance dependence on ALD Al2O3 oxidation source
168Al2O3Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
169Al2O3Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
170Al2O3Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
171Al2O3Method of Fabrication for Encapsulated Polarizing Resonant Gratings
172Al2O3Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
173Al2O3Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
174Al2O3Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
175Al2O3Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
176Al2O3Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
177Al2O3Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
178Al2O3Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
179Al2O3N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
180Al2O3Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
181Al2O3Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
182Al2O3Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
183Al2O3Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
184Al2O3Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
185Al2O3Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
186Al2O3On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
187Al2O3On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
188Al2O3Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
189Al2O3Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
190Al2O3Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
191Al2O3Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
192Al2O3Passivation effects of atomic-layer-deposited aluminum oxide
193Al2O3Patterned deposition by plasma enhanced spatial atomic layer deposition
194Al2O3Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
195Al2O3Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
196Al2O3Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
197Al2O3Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
198Al2O3Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
199Al2O3Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
200Al2O3Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
201Al2O3Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
202Al2O3Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
203Al2O3Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
204Al2O3Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
205Al2O3Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
206Al2O3Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
207Al2O3Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
208Al2O3Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
209Al2O3Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
210Al2O3Propagation Effects in Carbon Nanoelectronics
211Al2O3Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
212Al2O3Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
213Al2O3Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
214Al2O3Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
215Al2O3Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
216Al2O3Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
217Al2O3Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
218Al2O3Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
219Al2O3Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
220Al2O3Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
221Al2O3Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
222Al2O3Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
223Al2O3Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
224Al2O3Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
225Al2O3Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
226Al2O3Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
227Al2O3Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
228Al2O3Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
229Al2O3Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
230Al2O3Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
231Al2O3Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
232Al2O3Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
233Al2O3Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
234Al2O3Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
235Al2O3Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
236Al2O3Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
237Al2O3Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
238Al2O3Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
239Al2O3Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
240Al2O3Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
241Al2O3The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
242Al2O3The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
243Al2O3The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
244Al2O3Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
245Al2O3Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
246Al2O3Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
247Al2O3TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
248Al2O3Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
249Al2O3Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
250Al2O3Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
251Al2O3Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
252Al2O3Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
253Al2O3Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
254Al2O3Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
255Al2O3Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
256Al2O3Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
257Al2O3Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
258Al2O3Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
259Al2O3Very high frequency plasma reactant for atomic layer deposition
260Al2O3Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
261Al2O3Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
262AlMgOExcellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
263AlONImproved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
264AlONImproved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
265AlONImprovement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
266AlONInterface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
267AlONStabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
268AlONThin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
269AlPxOyAtomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
270AlSixOyBand offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
271AlSixOyCharacteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
272AlSixOyComposite materials and nanoporous thin layers made by atomic layer deposition
273AlSixOyElectrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
274AlSixOyNanoporous SiO2 thin films made by atomic layer deposition and atomic etching
275AlStTiOEffect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
276AlTixOyAl2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
277AlTixOyCharacteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
278AlTixOyLow-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
279AlTixOyOptical and Electrical Properties of AlxTi1-xO Films
280AlTixOyPlasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
281AlTixOyPlasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
282AlTixOyRutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
283AuAtomic Layer Deposition of Gold Metal
284B:SiO2Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
285B2O3Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
286B2O3Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
287BaOPlasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
288BaTiO3High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
289BaTiO3Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
290BaTiO3Plasma-enhanced atomic layer deposition of BaTiO3
291Bi2O3Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
292BiFeO3Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
293CeO2Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
294CoOxA multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
295CoOxAtomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
296CoOxCharge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
297CoOxCo3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
298CoOxEfficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
299CoOxIntegrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
300CoOxRemote Plasma Atomic Layer Deposition of Co3O4 Thin Film
301CoOxRemote Plasma Atomic Layer Deposition of Co3O4 Thin Films
302CoOxSubstrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
303Cr2O3Radical Enhanced Atomic Layer Deposition of Metals and Oxides
304CuOxRadical Enhanced Atomic Layer Deposition of Metals and Oxides
305Did Not WorkDeposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
306Dy2O3Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
307Er:Al2O3Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
308Er2O3Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
309Er2O3Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
310Er2O3Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
311Er2O3Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
312Fe2O3Plasma enhanced atomic layer deposition of Fe2O3 thin films
313Fe2O3Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
314Ga:ZnOThe Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
315Ga2O3Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
316Ga2O3Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
317Ga2O3Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
318Ga2O3Electrical characteristics of β-Ga2O3 thin films grown by PEALD
319Ga2O3Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
320Ga2O3Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
321Ga2O3Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
322Ga2O3Plasma enhanced atomic layer deposition of Ga2O3 thin films
323Ga2O3Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
324Ga2O3Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
325Ga2O3RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
326Ga2O3Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
327Gd2O3Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
328GeZrO2Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
329HfAlOxProperties of HfAlO film deposited by plasma enhanced atomic layer deposition
330HfAlOxTailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
331HfLaOxBand alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
332HfLaOxCharacteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
333HfLaOxComparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
334HfLaOxFerroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
335HfLaOxLow temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
336HfLaOxProperties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
337HfO2A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
338HfO2An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
339HfO2Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
340HfO2Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
341HfO2AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
342HfO2Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
343HfO2Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
344HfO2Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
345HfO2Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
346HfO2Damage evaluation in graphene underlying atomic layer deposition dielectrics
347HfO2Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
348HfO2Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
349HfO2Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
350HfO2Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
351HfO2Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
352HfO2Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
353HfO2Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
354HfO2Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
355HfO2Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
356HfO2Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
357HfO2Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
358HfO2Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
359HfO2Hafnia and alumina on sulphur passivated germanium
360HfO2HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
361HfO2Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
362HfO2Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
363HfO2Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
364HfO2Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
365HfO2In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
366HfO2Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
367HfO2Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
368HfO2Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
369HfO2Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
370HfO2Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
371HfO2Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
372HfO2Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
373HfO2Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
374HfO2Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
375HfO2Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
376HfO2Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
377HfO2Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
378HfO2Optical properties and bandgap evolution of ALD HfSiOx films
379HfO2Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
380HfO2Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
381HfO2Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
382HfO2Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
383HfO2Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
384HfO2Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
385HfO2Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
386HfO2Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
387HfO2Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
388HfO2Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
389HfO2The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
390HfO2The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
391HfO2The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
392HfO2Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
393HfO2Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
394HfO2Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
395HfOFEffects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
396HfONElectrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
397HfONHfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
398HfONImprovement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
399HfSiOxAnnealing behavior of ferroelectric Si-doped HfO2 thin films
400HfSiOxEffect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
401HfSiOxFerroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
402HfSiOxInfluence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
403HfSiOxOptical properties and bandgap evolution of ALD HfSiOx films
404HfSiOxTaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
405HfSiOxThe effects of layering in ferroelectric Si-doped HfO2 thin films
406In2(S,O)3Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
407In2(S,O)3Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
408In2O3Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
409In2O3High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
410In2O3High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
411In2O3Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
412In2O3Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
413IrHigh-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
414IrTiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
415IrO2IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
416La2O3Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
417La2O3Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
418La2O3Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
419La2O3Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
420La2O3Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
421La2O3Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
422La2O3Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
423Li2CO3Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
424Li2OAtomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
425LiCoO2Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
426MgxZn1-xOUltraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
427MgOIn situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
428MgOPlasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
429MoOxAtomic layer deposition for perovskite solar cells: research status, opportunities and challenges
430MoOxAtomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
431MoOxControllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
432MoOxLow-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
433MoOxPlasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
434MoOxProcess Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
435MoWOControllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
436Nb2O5Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
437Nb2O5Radical Enhanced Atomic Layer Deposition of Metals and Oxides
438NiOxAtomic layer deposition for perovskite solar cells: research status, opportunities and challenges
439NiOxRadical Enhanced Atomic Layer Deposition of Metals and Oxides
440PdAtomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
441PdSub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
442Plasma StudyIon and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
443PtAtomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
444PtCatalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
445PtEncapsulation method for atom probe tomography analysis of nanoparticles
446PtGrowth of silica nanowires in vacuum
447PtIn situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
448PtNucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
449PtParallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
450PtPlasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
451PtRemote Plasma ALD of Platinum and Platinum Oxide Films
452PtRemote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
453PtRoom-Temperature Atomic Layer Deposition of Platinum
454PtSerpentine geometry for enhanced performance of nanometer-thin platinum bolometers
455PtStructural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
456PtStructure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
457PtSub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
458PtSupportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
459PtSurface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
460PtSurface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
461PtThe size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
462PtO2Remote Plasma ALD of Platinum and Platinum Oxide Films
463PtO2Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
464RuAtomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
465RuAtomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
466RuAtomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
467RuIn situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
468RuReliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
469RuStructural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
470RuStructure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
471RuThermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
472RuUnderstanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
473RuO2ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
474RuO2Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
475RuO2Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
476RuO2Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
477RuO2Radical Enhanced Atomic Layer Deposition of Metals and Oxides
478RuO2Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
479RuO2Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
480Sb2O5Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
481SiO2'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
482SiO2Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
483SiO2Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
484SiO2Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
485SiO2Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
486SiO2Breakdown and Protection of ALD Moisture Barrier Thin Films
487SiO2Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
488SiO2Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
489SiO2Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
490SiO2Comparative study of ALD SiO2 thin films for optical applications
491SiO2Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
492SiO2Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
493SiO2Designing high performance precursors for atomic layer deposition of silicon oxide
494SiO2Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
495SiO2Energy-enhanced atomic layer deposition for more process and precursor versatility
496SiO2Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
497SiO2Gate Insulator for High Mobility Oxide TFT
498SiO2Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
499SiO2High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
500SiO2High-Reflective Coatings For Ground and Space Based Applications
501SiO2Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
502SiO2Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
503SiO2Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
504SiO2Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
505SiO2Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
506SiO2Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
507SiO2Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
508SiO2Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
509SiO2Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
510SiO2Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
511SiO2On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
512SiO2On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
513SiO2Optical properties and bandgap evolution of ALD HfSiOx films
514SiO2Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
515SiO2Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
516SiO2Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
517SiO2Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
518SiO2Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
519SiO2Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
520SiO2Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
521SiO2Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
522SiO2Radical Enhanced Atomic Layer Deposition of Metals and Oxides
523SiO2Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
524SiO2Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
525SiO2Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
526SiO2Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
527SiO2Single-Cell Photonic Nanocavity Probes
528SiO2Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
529SiO2Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
530SiO2Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
531SiO2Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
532SiO2Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
533SiO2Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
534SiO2Symmetrical Al2O3-based passivation layers for p- and n-type silicon
535SiO2Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
536SiO2Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
537SiO2Trapped charge densities in Al2O3-based silicon surface passivation layers
538SiONPlasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
539SnO2Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
540SnO2Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
541SnO2Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
542SnO2Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
543SnO2Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
544SnO2Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
545SnO2SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
546SnO2Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
547SnO2Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
548SrOEffect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
549SrOEffect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
550SrOEnhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
551SrOLow-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
552SrOPlasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
553SrTa2O6Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
554SrTiO3Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
555SrTiO3Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
556SrTiO3Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
557SrTiO3Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
558SrTiO3Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
559SrTiO3Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
560SrTiO3Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
561SrTiO3Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
562SrTiO3Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
563SrTiO3Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
564SrTiO3Radical Enhanced Atomic Layer Deposition of Metals and Oxides
565SrTiO3Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
566Ta2O5Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
567Ta2O5Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
568Ta2O5Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
569Ta2O5Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
570Ta2O5Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
571Ta2O5Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
572Ta2O5Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
573Ta2O5Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
574Ta2O5Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
575Ta2O5Trilayer Tunnel Selectors for Memristor Memory Cells
576TaZrO2Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
577TiO2A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
578TiO2Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
579TiO2An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
580TiO2Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
581TiO2Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
582TiO2Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
583TiO2Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
584TiO2Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
585TiO2Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
586TiO2Biofilm prevention on cochlear implants
587TiO2Bipolar resistive switching in amorphous titanium oxide thin film
588TiO2Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
589TiO2Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
590TiO2Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
591TiO2Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
592TiO2Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
593TiO2Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
594TiO2Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
595TiO2Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
596TiO2Energy-enhanced atomic layer deposition for more process and precursor versatility
597TiO2Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
598TiO2Epitaxial 1D electron transport layers for high-performance perovskite solar cells
599TiO2Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
600TiO2Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
601TiO2Flexible Memristive Memory Array on Plastic Substrates
602TiO2Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
603TiO2Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
604TiO2Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
605TiO2Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
606TiO2High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
607TiO2High-efficiency embedded transmission grating
608TiO2Highly efficient and bending durable perovskite solar cells: toward a wearable power source
609TiO2Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
610TiO2Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
611TiO2Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
612TiO2In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
613TiO2In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
614TiO2Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
615TiO2Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
616TiO2Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
617TiO2Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
618TiO2Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
619TiO2Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
620TiO2Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
621TiO2Low temperature temporal and spatial atomic layer deposition of TiO2 films
622TiO2Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
623TiO2Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
624TiO2Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
625TiO2Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
626TiO2Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
627TiO2Oxygen migration in TiO2-based higher-k gate stacks
628TiO2Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
629TiO2Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
630TiO2Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
631TiO2Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
632TiO2Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
633TiO2Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
634TiO2Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
635TiO2Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
636TiO2Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
637TiO2Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
638TiO2Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
639TiO2Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
640TiO2Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
641TiO2Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
642TiO2Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
643TiO2Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
644TiO2Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
645TiO2Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
646TiO2Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
647TiO2The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
648TiO2The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
649TiO2The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
650TiO2Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
651TiO2Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
652TiO2TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
653TiO2Transient characterization of the electroforming process in TiO2 based resistive switching devices
654TiO2Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
655TiO2X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
656TiONNitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
657TiP2O7Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
658TiSiOOptical and Electrical Properties of TixSi1-xOy Films
659TiTaOPreliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
660V2O5Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
661V2O5Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
662V2O5Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
663WO3Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
664WO3Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
665WO3Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
666Y2O3Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
667Y2O3Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
668Y2O3Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
669Y2O3Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
670YSZAtomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
671YSZEffect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
672YSZEffects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
673YSZPlasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
674YSZSurface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
675ZnOBand alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
676ZnOBipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
677ZnOComparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
678ZnOEffect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
679ZnOElectrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
680ZnOElectrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
681ZnOEmploying Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
682ZnOEnhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
683ZnOForming-free resistive switching of tunable ZnO films grown by atomic layer deposition
684ZnOGrowth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
685ZnOHighly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
686ZnOHysteresis behaviour of top-down fabricated ZnO nanowire transistors
687ZnOImproving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
688ZnOLow-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
689ZnOPhotochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
690ZnOPlasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
691ZnOPlasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
692ZnOPlasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
693ZnORadical Enhanced Atomic Layer Deposition of Metals and Oxides
694ZnORemote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
695ZnOSelf-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
696ZnOSpectroscopy and control of near-surface defects in conductive thin film ZnO
697ZnOStructural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
698ZnOTailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
699ZnOThe "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
700ZnOThe effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
701ZnOThe Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
702ZnOThe Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
703ZnOTop-down fabricated ZnO nanowire transistors for application in biosensors
704ZnOTuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
705ZnOWetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
706ZnPO4Plasma-enhanced atomic layer deposition of zinc phosphate
707ZnSnOGrowth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
708ZrO2Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
709ZrO2Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
710ZrO2Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
711ZrO2Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
712ZrO2Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
713ZrO2Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
714ZrO2Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
715ZrO2Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
716ZrO2High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
717ZrO2Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
718ZrO2Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
719ZrO2Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
720ZrO2Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
721ZrO2Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
722ZrO2Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
723ZrO2Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
724ZrO2PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
725ZrO2PEALD ZrO2 Films Deposition on TiN and Si Substrates
726ZrO2Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
727ZrO2Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
728ZrO2Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
729ZrO2Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
730ZrO2Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
731ZrO2Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
732ZrO2The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
733ZrO2Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
734ZrO2Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
735ZrO2ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
736ZrO2ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
737ZrONEnhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
738ZrONImpact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
739ZrONImproved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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