|1||Strem Chemicals, Inc.||Tetraethoxysilane, min. 98% TEOS|
www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.
If you would like your company's precursor products listed, or your existing listing changed or removed, send us an email.
Your search for publications using this chemistry returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||AlSixOy||Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition|
|2||AlSixOy||Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition|
|3||SiO2||Radical Enhanced Atomic Layer Deposition of Metals and Oxides|
|4||TiSiO||Optical and Electrical Properties of TixSi1-xOy Films|
I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. If you know of publications I have missed or a database entry is wrong, send me an email at: email@example.com
© 2014-2018 plasma-ald.com