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TetraEthyl OrthoSilicate, Si(OC2H5)4, TEOS, CAS# 78-10-4

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1Strem Chemicals, Inc.Tetraethoxysilane, min. 98% TEOS does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1AlSixOyCharacteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
2AlSixOyElectrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
3SiO2Radical Enhanced Atomic Layer Deposition of Metals and Oxides
4TiSiOOptical and Electrical Properties of TixSi1-xOy Films


I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. If you know of publications I have missed or a database entry is wrong, send me an email at:


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