3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane, CAS# 15112-89-7

Where to buy

NumberVendorRegionLink
1GelestπŸ‡ΊπŸ‡ΈTris(Dimethylamino)Silane
2Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%
3Pegasus ChemicalsπŸ‡¬πŸ‡§Tris(dimethylamino)silane
4Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD
5DOCK/CHEMICALSπŸ‡©πŸ‡ͺTris(dimethylamino)silane
6EreztechπŸ‡ΊπŸ‡ΈTris(dimethylamino) silane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 71 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
2Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
3Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
4Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
5Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
6HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
7Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
8Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
9Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
10Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
11The effects of layering in ferroelectric Si-doped HfO2 thin films
12Comparative study of ALD SiO2 thin films for optical applications
13Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
14Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
15Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
16Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
17Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
18Optical properties and bandgap evolution of ALD HfSiOx films
19Composite materials and nanoporous thin layers made by atomic layer deposition
20Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
21Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
22Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
23Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
24Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
25Optical properties and bandgap evolution of ALD HfSiOx films
26Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and Ξ²-Ga2O3 (2̅01)
27Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
28Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
29Atomic layer deposition of metal-oxide thin films on cellulose fibers
30Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
31Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
32Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
33Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
34Single-Cell Photonic Nanocavity Probes
35Annealing behavior of ferroelectric Si-doped HfO2 thin films
36Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
37Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
38Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
39Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
40Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
41Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
42Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
43Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
44Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
45An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
46Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
47Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
48Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
49Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
50Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
51Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
52Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
53Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
54Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
55Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
56Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
57Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
58Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
59Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
60Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
61Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
62Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
63TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
64Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
65Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
66Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
67High-Reflective Coatings For Ground and Space Based Applications
68Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
69Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
703D structure evolution using metastable atomic layer deposition based on planar silver templates
71Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides