TDMAZ, Tetrakis[(DiMethyl)Amido] Zirconium, [Me2N]4Zr, CAS# 19756-04-8

Where to buy

NumberVendorLink
1Strem Chemicals, Inc.Tetrakis(dimethylamino)zirconium, 99% TDMAZ
2Strem Chemicals, Inc.Tetrakis(dimethylamino)zirconium(IV), 99% TDMAZ, contained in 50 ml cylinder for CVD/ALD
3Strem Chemicals, Inc.Tetrakis(dimethylamino)zirconium, 99% (99.99%-Zr) TDMAZ

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 24 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberCompositionTitle
1YSZAtomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
2YSZEffect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
3YSZEffects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
4YSZPlasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
5YSZSurface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
6ZirconeLow-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
7ZrNAxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
8ZrNInfluence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
9ZrNLow temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
10ZrNProbing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
11ZrO2Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
12ZrO2Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
13ZrO2Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
14ZrO2Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
15ZrO2Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
16ZrO2Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
17ZrO2Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
18ZrO2Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
19ZrO2Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
20ZrO2Single-Cell Photonic Nanocavity Probes
21ZrO2Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
22ZrO2Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
23ZrO2Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
24ZrO2ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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