Hafnium Tetrachloride, HfCl4, CAS# 13499-05-3

Where to buy

NumberVendorRegionLink
1EreztechπŸ‡ΊπŸ‡ΈHafnium (IV) Chloride
2Pegasus ChemicalsπŸ‡¬πŸ‡§Hafnium tetrachloride
3EpiValenceπŸ‡¬πŸ‡§Hafnium chloride
4EntegrisπŸ‡ΊπŸ‡ΈHfCl4

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
2Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
3Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
4Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
5Radical Enhanced Atomic Layer Deposition of Metals and Oxides
6Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
7Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing