Bis(diethylamino)silane, BDEAS, SAM-24, (Et2N)2SiH2, CAS# 27804-64-4

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1Strem Chemicals, Inc.Bis(diethylamino)silane, 97% BDEAS

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 26 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberCompositionTitle
1B:SiO2Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
2SiNxLow-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
3SiNxSingle-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
4SiO2'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
5SiO2Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
6SiO2Breakdown and Protection of ALD Moisture Barrier Thin Films
7SiO2Comparative study of ALD SiO2 thin films for optical applications
8SiO2Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
9SiO2Designing high performance precursors for atomic layer deposition of silicon oxide
10SiO2Energy-enhanced atomic layer deposition for more process and precursor versatility
11SiO2Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
12SiO2Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
13SiO2High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
14SiO2Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
15SiO2Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
16SiO2Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
17SiO2On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
18SiO2Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
19SiO2Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
20SiO2Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
21SiO2Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
22SiO2Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
23SiO2Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
24SiO2Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
25SiO2Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
26SiONPlasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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