SiO2 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing SiO2 films returned 81 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
2Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
3An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
4Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
5Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
6Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
7Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
8Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
9Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
10Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
11Breakdown and Protection of ALD Moisture Barrier Thin Films
12Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
13Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
14Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
15Chemical reactions during plasma-enhanced atomic layer deposition of SiO2 films employing aminosilane and O2/Ar plasma at 50°C
16Comparative study of ALD SiO2 thin films for optical applications
17Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
18Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
19Designing high performance precursors for atomic layer deposition of silicon oxide
20Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
21Effect of Plasma Power of Plasma Enhanced Atomic Layer Deposition Process for Gate Insulator Deposition in Top-Gate Thin-Film Transistors
22Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride
23Electrical Characteristics of p-Type Bulk Si Fin Field-Effect Transistor Using Solid-Source Doping With 1-nm Phosphosilicate Glass
24Energy-enhanced atomic layer deposition for more process and precursor versatility
25Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
26Flexible insulator of hollow SiO2 spheres and polyimide hybrid for flexible OLED
27Ga2O3 MOSFETs Using Spin-On-Glass Source/Drain Doping Technology
28GaN Nanowire MOSFET With Near-Ideal Subthreshold Slope
29Gate Insulator for High Mobility Oxide TFT
30Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
31High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
32High-Reflective Coatings For Ground and Space Based Applications
33Impact of oxygen plasma on nitrided and annealed atomic layer deposited SiO2/high-k/metal gate for high-voltage input and output fin-shaped field effect transistor devices
34Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
35Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
36Influence of Pre and Post-treatments on Plasma Enhanced ALD SiO2 and Al2O3 layers on GaN
37Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control
38Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
39Investigation of Bulk and DTMOS triple-gate devices under 60 MeV proton irradiation
40Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
41Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
42Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
43Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
44Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
45Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
46Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
47Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
48Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
49Non-destructive acoustic metrology and void detection in 3x50μm TSV
50On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
51On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
52Optical properties and bandgap evolution of ALD HfSiOx films
53Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
54Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
55Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
56Plasma enhanced atomic layer deposition of SiNx:H and SiO2
57Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
58Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
59Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
60Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
61Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
62Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
63Programmable on-chip DNA compartments as artificial cells
64Propagating gene expression fronts in a one-dimensional coupled system of artificial cells
65Radical Enhanced Atomic Layer Deposition of Metals and Oxides
66Room temperature CO2 detection using interdigitated capacitors with heteropolysiloxane sensing films
67Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
68Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
69Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
70Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
71Single-Cell Photonic Nanocavity Probes
72Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
73Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
74Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
75Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
76Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
77Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
78Symmetrical Al2O3-based passivation layers for p- and n-type silicon
79Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
80Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
81Trapped charge densities in Al2O3-based silicon surface passivation layers


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