SiO2 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing SiO2 films returned 73 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
2An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
3Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
4Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
5Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
6Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
7Breakdown and Protection of ALD Moisture Barrier Thin Films
8Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
9Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
10Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
11Chemical reactions during plasma-enhanced atomic layer deposition of SiO2 films employing aminosilane and O2/Ar plasma at 50°C
12Comparative study of ALD SiO2 thin films for optical applications
13Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
14Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
15Designing high performance precursors for atomic layer deposition of silicon oxide
16Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
17Effect of Plasma Power of Plasma Enhanced Atomic Layer Deposition Process for Gate Insulator Deposition in Top-Gate Thin-Film Transistors
18Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride
19Electrical Characteristics of p-Type Bulk Si Fin Field-Effect Transistor Using Solid-Source Doping With 1-nm Phosphosilicate Glass
20Energy-enhanced atomic layer deposition for more process and precursor versatility
21Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
22Flexible insulator of hollow SiO2 spheres and polyimide hybrid for flexible OLED
23Gate Insulator for High Mobility Oxide TFT
24Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
25High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
26High-Reflective Coatings For Ground and Space Based Applications
27Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
28Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
29Influence of Pre and Post-treatments on Plasma Enhanced ALD SiO2 and Al2O3 layers on GaN
30Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control
31Investigation of Bulk and DTMOS triple-gate devices under 60 MeV proton irradiation
32Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
33Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
34Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
35Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
36Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
37Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
38Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
39Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
40Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
41Non-destructive acoustic metrology and void detection in 3x50μm TSV
42On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
43On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
44Optical properties and bandgap evolution of ALD HfSiOx films
45Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
46Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
47Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
48Plasma enhanced atomic layer deposition of SiNx:H and SiO2
49Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
50Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
51Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
52Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
53Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
54Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
55Programmable on-chip DNA compartments as artificial cells
56Propagating gene expression fronts in a one-dimensional coupled system of artificial cells
57Radical Enhanced Atomic Layer Deposition of Metals and Oxides
58Room temperature CO2 detection using interdigitated capacitors with heteropolysiloxane sensing films
59Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
60Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
61Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
62Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
63Single-Cell Photonic Nanocavity Probes
64Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
65Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
66Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
67Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
68Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
69Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
70Symmetrical Al2O3-based passivation layers for p- and n-type silicon
71Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
72Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
73Trapped charge densities in Al2O3-based silicon surface passivation layers


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