ZrO2 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing ZrO2 films returned 38 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
2Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
3Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
4Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
5Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
6Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
7Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
8Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
9Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
10High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
11High Mobility (210cm2/Vs), High Capacitance (7.2uF/cm2) ZrO2 on GaN Metal Oxide Semiconductor Capacitor via ALD
12Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
13Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
14Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
15Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
16In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
17Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
18Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
19Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
20Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
21PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
22PEALD ZrO2 Films Deposition on TiN and Si Substrates
23Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
24Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
25Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
26Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
27RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
28Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
29Single-Cell Photonic Nanocavity Probes
30Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
31Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
32Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
33Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
34The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
35Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
36Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
37ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
38ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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