Your search for plasma enhanced atomic layer deposition publications discussing HfAlOx films returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors|
|2||High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors|
|3||Properties of HfAlO film deposited by plasma enhanced atomic layer deposition|
|4||Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping|
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