Picosun R200 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Picosun R200 hardware returned 19 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
2Atomic Layer Deposition of Gold Metal
3Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
4Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
5Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
6Comparative study of ALD SiO2 thin films for optical applications
7Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
8High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
9In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
10Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
11Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
12PEALD AlN: controlling growth and film crystallinity
13Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
14Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
15Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
16Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
17Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
18Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
19Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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