Harm C. M. Knoops Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Harm C. M. Knoops returned 37 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
2Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
3Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
4Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
5'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
6Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
7Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
8Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
9Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
10Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
11Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
12Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
13Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
14Innovative remote plasma source for atomic layer deposition for GaN devices
15Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
16Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
17Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
18Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
19Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
20Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
21Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
22Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
23Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
24Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
25Room-Temperature Atomic Layer Deposition of Platinum
26Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
27Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
28Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
29Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
30Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
31Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
32Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
33Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
34Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
35Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
36Remote Plasma ALD of Platinum and Platinum Oxide Films
37Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers