Daniele Caimi Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Daniele Caimi returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1CMOS-compatible Replacement Metal Gate InGaAs-OI FinFET With ION= 156 μA/μm at VDD= 0.5 V and IOFF= 100 nA/μm
2Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
3Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
4A scaled replacement metal gate InGaAs-on-Insulator n-FinFET on Si with record performance