Inductively Coupled Plasma Sources for ALD and Surface Engineering
Plasma ALD, LLC develops inductively coupled plasma sources for integration with atomic layer deposition and other advanced surface treatment systems.
Our 300W compact ICP source is ideal for plasma enhanced atomic layer deposition and other surface engineering applications.
If your plasma source needs differ from what is shown here, contact us. Our plasma source experience and design capabilities extend beyond this product line.
The plasma enhanced atomic layer deposition publication database is located here.
