Inductively Coupled Plasma Sources for ALD and Surface Engineering

Plasma ALD, LLC develops modular inductively coupled plasma sources designed for integration into atomic layer deposition and other advanced surface treatment systems.

Shown here is our 300W compact ICP source ideal for plasma enhanced atomic layer deposition and other surface engineering applications.

If your plasma source needs differ from what is shown here, contact us. Our plasma source experience and design capabilities extend beyond this product line.

The plasma enhanced atomic layer deposition publication database is located here.