Inductively Coupled Plasma Sources for ALD and Surface Engineering
Plasma ALD, LLC develops inductively coupled plasma sources for integration with atomic layer deposition and other advanced surface treatment systems.
Our compact ICP source is ideal for plasma enhanced atomic layer deposition and other surface engineering applications.
Draw on our decades of plasma processing experience to get the right plasma source and the assistance with integration and process optimization to get the results you need.
Not seeing what you need? Our plasma source experience and design capabilities extend beyond this product line.
The plasma enhanced atomic layer deposition publication database is located here.
