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Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
Type:
Journal
Info:
Journal of The Electrochemical Society, 156 (11) H852-H859 (2009)
Date:
2009-10-01
Author Information
| Name | Institution |
|---|---|
| Christoph Hoßbach | Technische Universität Dresden |
| S. Teichert | Qimonda |
| J. Thomas | IFW Dresden |
| L. Wilde | Fraunhofer Center Nanoelectronic Technology |
| H. Wojcik | Technische Universität Dresden |
| B. Adolphi | Technische Universität Dresden |
| M. Bertram | Technische Universität Dresden |
| U. Mühle | Qimonda |
| Matthias Albert | Technische Universität Dresden |
| S. Menzel | IFW Dresden |
| B. Hintze | Qimonda |
| Johann W. Bartha | Technische Universität Dresden |
Films
Plasma TaCN
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope
Characteristic: Conformality, Step Coverage
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: EFTEM, Energy Filtered Transmission Electron Microscopy
Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Density
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: ELS, EELS, Electron Energy Loss Spectroscopy
Characteristic: Barrier Characteristics
Analysis: BTS, Bias Temperature Stressing
Characteristic: Leakage Current
Analysis: BTS, Bias Temperature Stressing
Substrates
| Si(100) |
| SiO2 |
Notes
| Si(100) samples run with and without HF-last |
| All samples received SC-1 clean. |
| Ion bombardment lead to film etch under certain conditions |
| 25:1 trench structures studied |
| TaCN wetted carbon nanotubes |
| 49 |